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Biophysical Journal 87:1351-1359 (2004)
© 2004 The Biophysical Society

Imaging Neuronal Seal Resistance on Silicon Chip using Fluorescent Voltage-Sensitive Dye

Dieter Braun and Peter Fromherz

Department of Membrane and Neurophysics, Max Planck Institute for Biochemistry, Martinsried/Munich, Germany

Correspondence: Address reprint requests to Peter Fromherz, Dept. of Membrane and Neurophysics, Max Planck Institute for Biochemistry, Martinsried/Munich, Germany 82152. E-mail: fromherz{at}biochem.mpg.de.

The electrical sheet resistance between living cells grown on planar electronic contacts of semiconductors or metals is a crucial parameter for bioelectronic devices. It determines the strength of electrical signal transduction from cells to chips and from chips to cells. We measured the sheet resistance by applying AC voltage to oxidized silicon chips and by imaging the voltage change across the attached cell membrane with a fluorescent voltage-sensitive dye. The phase map of voltage change was fitted with a planar core-coat conductor model using the sheet resistance as a free parameter. For nerve cells from rat brain on polylysine as well as for HEK293 cells and MDCK cells on fibronectin we find a similar sheet resistance of 10 M{Omega}. Taking into account the independently measured distance of 50 nm between chip and membrane for these cells, we obtain a specific resistance of 50 {Omega}cm that is indistinguishable from bulk electrolyte. On the other hand, the sheet resistance for erythrocytes on polylysine is far higher, at ~1.5 G{Omega}. Considering the distance of 10 nm, the specific resistance in the narrow cleft is enhanced to 1500 {Omega}cm. We find this novel optical method to be a convenient tool to optimize the interface between cells and chips for bioelectronic devices.




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